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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Xiao, Y.G. Li, Z.M.S. Uehara, K. Lestrade, M. Li, Z.Q. |
| Copyright Year | 2011 |
| Description | Author affiliation: Crosslight Software Inc, 121-3989 Henning Drive, Burnaby, BC V5C 6P8, Canada (Xiao, Y.G.; Li, Z.M.S.; Uehara, K.; Lestrade, M.; Li, Z.Q.) |
| Abstract | Three dimensional modeling of active pixel sensor with microlens is reported by using an advanced drift-diffusion simulator together with finite difference time domain method for optical effect in this work. The opto-electronic responses are presented versus various power intensity and illumination wavelength. The aperture size of the isolated metal layer is also discussed. Whereas microlens is shown to improve the sensitivity, the aperture size of the isolated metal layer should be optimized to avoid sensitivity loss. The presented results demonstrate a methodological and technical capability for 3D modeling optimization of complex CMOS image sensor. |
| Starting Page | 1 |
| Ending Page | 2 |
| File Size | 685736 |
| Page Count | 2 |
| File Format | |
| ISBN | 9781457713446 |
| e-ISBN | 9784863481824 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2011-10-30 |
| Publisher Place | Japan |
| Access Restriction | Subscribed |
| Rights Holder | The Japan Society of App |
| Subject Keyword | Semiconductor device modeling Apertures Optical imaging CMOS integrated circuits |
| Content Type | Text |
| Resource Type | Article |
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