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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Yongju Zheng Isaacs-Smith, T. Ahyi, A.C. Dhar, S. Mooney, P.M. |
| Copyright Year | 2015 |
| Description | Author affiliation: Dept. of Phys., Auburn Univ., Auburn, AL, USA (Yongju Zheng; Isaacs-Smith, T.; Ahyi, A.C.; Dhar, S.) || Phys. Dept., Simon Fraser Univ., Burnaby, BC, Canada (Mooney, P.M.) |
| Abstract | In this work, we have investigated the effect of Antimony counter-doping in channel region of 4H-SiC MOSFETs with moderately doped p-body, relevant for power applications. Using this process, improved sub-threshold slope and high channel mobility have been achieved in conjunction with high threshold voltage. Our results indicate that the improvement in transport is associated with Sb donors close to the surface, which have negligible effect on interface trap density. |
| Starting Page | 253 |
| Ending Page | 256 |
| File Size | 457516 |
| Page Count | 4 |
| File Format | |
| e-ISBN | 9781467378857 |
| DOI | 10.1109/WiPDA.2015.7369270 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2015-11-02 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Channel mobility MOSFET Annealing Silicon carbide Counter-doping Doping Logic gates P-body doping Antimony Threshold voltage 4H-SiC |
| Content Type | Text |
| Resource Type | Article |
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