NDLI: Analysis of ellipsometric data for nano transparent film

Content Provider	IEEE Xplore Digital Library
Author	Yuan Zhao Ming-Yu Sheng
Copyright Year	2010
Description	Author affiliation: Department of Electronics Information Engineering, Shanghai business school, 200235, China (Ming-Yu Sheng) \|\| Department of Optics and Electricity, Shanghai Second Polytechnic University, 201209, China (Yuan Zhao)
Abstract	Nano transparent film is widely used in the areas of photovoltaic, nanophotonics and microelectronics. The optical parameters of nano transparent film is studies by the modified ellipsometric method. In the traditional analysis of ellipsometric data, the incident light is considered as a definite plane wave. But in reality, the incident light is a finite spatial extend wavepack. Therefore, the longitude shifts due to the thickness of dielectric film, and its effect on the normalized intensity of multiple reflected wave packets in single dielectric film exit. Using the modified ellipsometry, the analysis is of high accuracy and show the result which is in good agreement with experimentally measured data.
Starting Page	1
Ending Page	3
File Size	319139
Page Count	3
File Format	PDF
ISBN	9781424483938
e-ISBN	9781424483945
e-ISBN	9781424483921
DOI	10.1109/AOM.2010.5713598
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2010-12-03
Publisher Place	China
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Thin films Optical polarization Refractive index Optical variables control Optical reflection Optical films Optical surface waves Ellipsometry
Content Type	Text
Resource Type	Article

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