NDLI: Active multivariable optimal control of a planar magnetic levitator

Content Provider	IEEE Xplore Digital Library
Author	Kim, W.-J. Trumper, D.L.
Copyright Year	1997
Description	Author affiliation: MIT, Cambridge, MA, USA (Kim, W.-J.)
Abstract	We discuss multivariable optimal control of a six-degree-of-freedom magnetic levitator with large planar motion capability. A single moving part, namely the platen, generates all the motions required for focusing and alignment, and large planar motions (50/spl times/50 mm) for positioning for photolithography in semiconductor manufacturing. We derive a state-space dynamic model for the planar levitator, and implement a multivariable optimal controller for its lateral mode control. The magnetically levitated stage shows tens-of-nanometer positioning noise suitable for the next generation photolithography. We also demonstrate that it follows a 20-mm step motion command in only 120 ms. The position command is planned by adapting a time-optimal control result. Magnetic levitation is a promising technology for use in high-precision active motion control applications.
Starting Page	97
Ending Page	102
File Size	653619
Page Count	6
File Format	PDF
ISBN	0780338766
DOI	10.1109/CCA.1997.627485
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1997-10-05
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Magnetic levitation Optimal control Lithography Magnetic semiconductors Motion control Semiconductor device noise Lenses Throughput Prototypes Magnetic noise
Content Type	Text
Resource Type	Article

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4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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