NDLI: Chemical reaction thermodynamic model of Low Pressure CVD for Nano-TiO2 film preparation

Content Provider	IEEE Xplore Digital Library
Author	Tao Li Junfeng Yang Hong-Chao Zhang Yuan, C.
Copyright Year	2012
Description	Author affiliation: Department of Mechanical Engineering, University of Wisconsin, Milwaukee 53201, USA (Yuan, C.) \|\| School of Mechanical Engineering, Dalian University of Technology, Dalian 116024, China (Tao Li; Junfeng Yang; Hong-Chao Zhang)
Abstract	With its unique and perfect performance, Nano-TiO2 film has been widely used in many fields. However, the preparation of Nano-TiO2 film has significant sustainability issues including heavy use of energy and materials, low production efficiency, toxic chemical emissions, etc. In this research, case study is conducted on a Low Pressure Chemical Vapor Deposition (LPCVD) process for nano-TiO2 film preparation. For studying chemical reaction energy consumption of LPCVD process, film preparation techniques, chemical engineering thermodynamics and the law of thermodynamics are used to establish parametric thermodynamic model with such thermodynamic metrics as enthalpy change, entropy change and effective energy change. The heat production rate of chemical reaction has been obtained based on reaction rate function and thermodynamic model. Setting certain chemical reaction condition, the corresponding thermodynamic values of Nano-TiO2 film preparation are calculated. At the same time, the energy utilization and material utilization are obtained. To validate the results, the LPCVD process is simulated with Fluent software. The calculated results are compared with the simulation results and are validated. The research can be the basis theory of processes and equipment energy optimization for Nano-TiO2 film preparation.
Starting Page	1
Ending Page	6
File Size	747996
Page Count	6
File Format	PDF
ISBN	9781467320030
ISSN	21575258
e-ISBN	9781467320047
DOI	10.1109/ISSST.2012.6228023
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-05-16
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Chemicals Films Entropy Thermodynamics Standards Heating Mathematical model Energy efficiency Low Pressure Chemical Vapor Deposition Nano-TiO2 film Thermodynamic model
Content Type	Text
Resource Type	Article

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