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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Dong, L.M. Lan, S. Yang, J.X. Chi, X.C. |
| Copyright Year | 2003 |
| Description | Author affiliation: Harbin Univ. of Sci. & Technol., China (Dong, L.M.; Lan, S.; Yang, J.X.; Chi, X.C.) |
| Abstract | Application of plasma chemistry for gas cleaning is gaining prominence in recent years, mainly from the energy consideration point of view. Normally, the gas treatment is carried out at or above room temperature by the conventional dry-type corona reactor. However, this treatment is still inadequate for the removal of certain stable gases present in the flue gas mixture. In this work, a wet-type corona reactor is presented that can simultaneously remove NO and SO/sub 2/ at low temperatures and at atmospheric pressure. The experimental results show both removal rate of NO and SO/sub 2/ are improved in wet-type reactor than that of dry-type reactor. NO is mostly oxidized into NO/sub 2/ by the reaction with O and O/sub 3/ and NO/sub 2/ is change into HNO/sub 3/ by the reaction with OH, which is generated from H/sub 2/O. Most of the SO/sub 2/ removal is attributed to the absorption into the water film and the enhancement by the discharge plasma is small. |
| Starting Page | 440 |
| Ending Page | 443 |
| File Size | 226726 |
| Page Count | 4 |
| File Format | |
| ISBN | 0780379101 |
| DOI | 10.1109/CEIDP.2003.1254887 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2003-10-19 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Plasma chemistry Chemical reactors Corona Inductors Chemical technology Plasma temperature Electron beams Nitrogen Plasma applications Nuclear and plasma sciences |
| Content Type | Text |
| Resource Type | Article |
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