NDLI: Contact properties of micromachined Ni probes

Content Provider	IEEE Xplore Digital Library
Author	Itoh, T. Kawamura, S. Kataoka, K. Suga, T.
Copyright Year	2003
Description	Author affiliation: Res. Center for Adv. Sci. & Technol., The Univ. of Tokyo, Japan (Itoh, T.; Kawamura, S.; Kataoka, K.; Suga, T.)
Abstract	The authors have investigated the aluminum-contact properties of two types of micromachined nickel probes, designed for low-contact force and high density probe cards. One probe is a micro-machined Ni curl-up cantilever, which was realized utilizing electroplating deposition of two layers having different internal stress, and has the low force constant of 0.1-0.3 N/m. The other is the Ni microcantilever designed to make contact to pad electrodes by buckling at a load of about 5 mN. This buckling contact has the advantage that the contact forces of all the probes could be almost uniform. For the two types of probes, although low contact resistance could not be obtained by only mechanical pressure, a contact resistance of around 1 /spl Omega/ was obtained using the fritting process, in which a voltage is applied between a pair of probes. For the case of the curl-up micro-cantilevers, the force required to make low resistance contact was smaller than 10 /spl mu/N. A fritting current larger than 200 mA makes it possible to decrease the contact resistance to around 1 /spl Omega/ for both types of micro-machined probes.
Sponsorship	Components, Packaging & Manuf. Technol. Soc. IEEE
Starting Page	223
Ending Page	227
File Size	346575
Page Count	5
File Format	PDF
ISBN	0780378628
DOI	10.1109/HOLM.2003.1246502
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2003-09-10
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Probes Nickel Electrodes Substrates Fabrication Electric resistance Contact resistance Tungsten Voltage Testing
Content Type	Text
Resource Type	Article

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