NDLI: An Analytical Error Model for Pattern Clipping in DNA Self-Assembly

Content Provider	IEEE Xplore Digital Library
Author	Arani, Z.M. Hashempour, M. Lombardi, F.
Copyright Year	2010
Abstract	Large and complex structures commonly referred to as patterns can be generated using DNA-like self-assembly. Self-assembly has an algorithmic nature, that is suitable for diverse applications in nano computing and manufacturing. This paper deals with the error characterization and modeling encountered when only a partial pattern is grown by DNA self-assembly. Partial growth is accomplished by clipping and utilizing specific structures (such as rulers, decoders and staircases) to allow the control of the growth process, i.e. the self-assembly can be either stopped or redirected as required. Initially the characterization of tile errors that are possible when clipping a pattern (such as the Sierpinski Triangle pattern), is presented with particular emphasis on the effects of erroneous aggregation in the capabilities of the clipping structures. An analytical approach is proposed to assess the effects of errors on clipping, this approach utilizes a geometric technique by which growth can be assessed with respect to the features of the desired (clipped) pattern. Simulation results are also presented, an excellent agreement between simulated and analytical results is achieved.
Starting Page	7
Ending Page	15
File Size	278604
Page Count	9
File Format	PDF
ISBN	9781424484478
ISSN	15505774
DOI	10.1109/DFT.2010.8
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2010-10-06
Publisher Place	Japan
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Tiles Self-assembly Decoding DNA Assembly Process control algorithmic assembly DNA self-assembly error analysis error tolerance
Content Type	Text
Resource Type	Article

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