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Content Provider | IEEE Xplore Digital Library |
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Author | Lianguan Shen Meiyan Wang Yu Hao Gaofei Zhao Zhao Shu Sun Yuan Xiaodong Wang Mujun Li Jinjin Zheng |
Copyright Year | 2008 |
Description | Author affiliation: Dept. of Precision Machinery & Precision Instrum., Univ. of Sci. & Technol. of China, Hefei (Lianguan Shen; Meiyan Wang; Yu Hao; Gaofei Zhao; Zhao Shu; Sun Yuan; Xiaodong Wang; Mujun Li; Jinjin Zheng) |
Abstract | A web-based collaborative design platform is presented for design MEMS structure. The design platform consists of four parts: mask design and optimization, lithography simulation, 3D reconstruction and synchronous display. Some special technologies in constructing the platform are described. An entity- based access control mechanism is employed to settle confliction in collaborative design process; MC algorithm is used to reconstruct 3D entities. A method is proposed to make up for the shortfall of MC to cover the holes in forming 3D surface. Application of the research will shorten the production cycle of MEMS and access higher accuracy significantly. |
Starting Page | 913 |
Ending Page | 918 |
File Size | 631956 |
Page Count | 6 |
File Format | |
ISBN | 9781424416509 |
DOI | 10.1109/CSCWD.2008.4537101 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 2008-04-16 |
Publisher Place | China |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Micromechanical devices Lithography Collaboration Design optimization Three dimensional displays Access control Process design Algorithm design and analysis Surface reconstruction Production Synchronous display Collaborative Design Confliction avoid 3D reconstruction MEMS |
Content Type | Text |
Resource Type | Article |
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