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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Burgess, S.R. Buchanan, K.E. Butler, D.C. Urbansky, N. Schmidbauer, S. |
| Copyright Year | 2001 |
| Description | Author affiliation: Trikon Technol., Newport, UK (Burgess, S.R.) |
| Abstract | Results are presented for long throw and ionized PVD layers for W-plug liner applications. 245 mm and 430 mm long throw modules are discussed, the latter being shown to be applicable to sub-0.17 /spl mu/m contacts when combined with very low process pressures. Data is presented showing that stable contacts can be produced without the damage risks associated with high energy ionized PVD processes. For metal applications above contact, a novel PVD module is shown to have particular benefits at via level. Chain data is presented showing >15% reduction in via resistance compared to any combination of i-PVD/long throw Ti/TiN sequences. |
| Starting Page | 97 |
| Ending Page | 100 |
| File Size | 472774 |
| Page Count | 4 |
| File Format | |
| ISBN | 0780365550 |
| ISSN | 10788743 |
| DOI | 10.1109/ASMC.2001.925625 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2001-04-23 |
| Publisher Place | Germany |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Atherosclerosis Tin Manufacturing processes Contact resistance Integrated circuit interconnections Random access memory Particle production Collimators Costs Substrates |
| Content Type | Text |
| Resource Type | Article |
| Subject | Industrial and Manufacturing Engineering Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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