NDLI: Influence of applied electric field on crystalline structure and thermo-optical effect of oriented PVDF thin films

Content Provider	IEEE Xplore Digital Library
Author	Liu Wei-guo Xi Ying-xue Fan Hui-qing Yang Chen Niu Xiao-ling
Copyright Year	2009
Description	Author affiliation: Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory, School of Optoelectronic Engineering, Xi'an Technological University, No 4 North Jinhua Road, 710032, China (Liu Wei-guo; Xi Ying-xue; Niu Xiao-ling) \|\| State Key Laboratory of Solidification Processing, School of Materials Science and Engineering, Northwestern Polytechnical University, No 127 West Youyi Road, Xi'an 710072, China (Fan Hui-qing; Yang Chen)
Abstract	The α phase oriented PVDF thin films were deposited using vacuum evaporation technology with a DC electric field applied on substrate holder during deposition process. X-ray Diffraction was used to examine the structural variations as a function of applied electric fields. DSC data allowed measurement of the melting temperatures and enthalpies of the PVDF granules and films deposited at various bias voltages, providing information on the changes in the crystallinity of the films. The thermo-optical (t.o) coefficient of α phase oriented PVDF thin films with different degree of crystallinity, which obtained by regulating the applied electric voltages varying from 0 to 5KV, were determined by using spectroscopic ellipsometer (SE) equipped with a heating stage. At temperatures ranging from 20 to 100°C the refractive index of all the PVDF films was negatively correlated with the temperature between 600 and 1600nm. The value of the t.o coefficient of PVDF films was calculated at all temperatures. During the deposition process, a decrease in the degree of crystallinity was observed with the increase of applied electric voltage. Furthermore, the absolute value of t.o. coefficient for film deposited at 5kV was slightly higher and decreased with increase in the degree of its crystallinity.
Starting Page	1
Ending Page	6
File Size	642994
Page Count	6
File Format	PDF
ISBN	9781424449705
ISSN	10994734
DOI	10.1109/ISAF.2009.5307534
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2009-08-23
Publisher Place	China
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Crystallization Transistors Voltage Temperature distribution Optical films Sputtering Vacuum technology Substrates X-ray diffraction Thermooptical devices
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Formation of organic ferroelectric thin films by vacuum evaporation under electric field

Structure and grain-size distribution of TiO/sub 2//SiO/sub 2/ thin film

Crystalline Structure and Morphology of ZnSe/CuPc Hybrid Thin Film prepared by Electron Beam Evaporator

Crystalline Structure and Surface Morphology of CdTe Thin Films

Crystallization Behavior Of Amorphous Terfenol-D Thin Films

Bright SrS TFEL devices prepared by multi-source deposition

Fabrication and characteristics of ZnO-based thin film transistors

Electrical conduction and electroluminescence of vacuum-evaporated thin TCNQ films

Unstressed nickel chromium thin films for thermo-optic application

Influence of applied electric field on crystalline structure and thermo-optical effect of oriented PVDF thin films

Similar Documents

Formation of organic ferroelectric thin films by vacuum evaporation under electric field

Structure and grain-size distribution of TiO/sub 2//SiO/sub 2/ thin film

Crystalline Structure and Morphology of ZnSe/CuPc Hybrid Thin Film prepared by Electron Beam Evaporator

Crystalline Structure and Surface Morphology of CdTe Thin Films

Crystallization Behavior Of Amorphous Terfenol-D Thin Films

Bright SrS TFEL devices prepared by multi-source deposition

Fabrication and characteristics of ZnO-based thin film transistors

Electrical conduction and electroluminescence of vacuum-evaporated thin TCNQ films

Unstressed nickel chromium thin films for thermo-optic application

Influence of applied electric field on crystalline structure and thermo-optical effect of oriented PVDF thin films