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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Lange, H. Foest, R. Schafer, J. Weltmann, K.-D. |
| Copyright Year | 1973 |
| Abstract | The vacuum ultraviolet (VUV) emissions from 115 to 200 nm from the effluent of an RF (1.2 MHz) capillary jet fed with pure argon and binary mixtures of argon and xenon or krypton (up to 20%) are analyzed. The feed gas mixture is emanating into air at normal pressure. The Ar2 excimer second continuum, observed in the region of 120-135 nm, prevails in the pure Ar discharge. It decreases when small amounts (as low as 0.5%) of Xe or Kr are added. In that case, the resonant emission of Xe at 147 nm (or 124 nm for Kr, respectively) becomes dominant. The Xe2 second continuum at 172 nm appears for higher admixtures of Xe (10%). Furthermore, several N I emission lines, the O I resonance line, and H I line appear due to ambient air. Two absorption bands (120.6 and 124.6 nm) are present in the spectra. Their origin could be unequivocally associated to O2 and O3. The radiance is determined end-on at varying axial distance in absolute units for various mixtures of Ar/Xe and Ar/Kr and compared to pure Ar. Integration over the entire VUV wavelength region provides the integrated spectral distribution. Maximum values of 2.2 mW middotmm-2middotsr-1 are attained in pure Ar and at a distance of 4 mm from the outlet nozzle of the discharge. By adding diminutive admixtures of Kr or Xe, the intensity and spectral distribution is effectively changed. |
| Sponsorship | IEEE Nuclear and Plasma Sciences Society |
| Starting Page | 859 |
| Ending Page | 865 |
| Page Count | 7 |
| File Size | 442215 |
| File Format | |
| ISSN | 00933813 |
| Volume Number | 37 |
| Issue Number | 6 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2009-06-01 |
| Publisher Place | U.S.A. |
| Access Restriction | One Nation One Subscription (ONOS) |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Atmospheric-pressure plasmas Gases Argon Plasma sources Feeds Resonance Absorption Plasma temperature Electrons Effluents vacuum ultraviolet (VUV) radiation Atmospheric pressure plasma jet (APPJ) microdischarges |
| Content Type | Text |
| Resource Type | Article |
| Subject | Nuclear and High Energy Physics Condensed Matter Physics |
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