NDLI: Effects of Cr and SiN contents on the microstructure and magnetic grain interactions of nanocomposite FePtCr-SiN thin films

Content Provider	IEEE Xplore Digital Library
Author	Chen, S.C. Kuo, P.C. Sun, A.C. Lie, C.T. Chiang, C.C.
Copyright Year	1965
Abstract	We have fabricated granular nanocomposite [(FePt)/sub 100-x/-Cr/sub x/]/sub 100-/spl delta//-(SiN)/sub /spl delta// thin films with x=0-25 at.% and /spl delta/=0-30 vol.% on natural-oxidized silicon substrate by dc and radio-frequency magnetron cosputtering of FePt, Cr, and Si/sub 3/N/sub 4/ targets. We annealed the as-deposited film in vacuum at 600/spl deg/C and then quenched it with ice water in order to transform the soft magnetic face-centered cubic /spl gamma/-FePt phase to the hard magnetic face-centered tetragonal /spl gamma//sub 1/-FePt phase (L1/sub 0/ phase). Transmission electron microscopy observation indicated that Cr and SiN can restrain the grain growth of magnetic grains, and that the structure of the film is a nonmagnetic SiN matrix with FePtCr particles dispersed in it. Average grain size of the magnetic particles decreased as Cr or SiN content increased. Energy dispersed spectrum (EDS) analysis showed that Cr exists mainly in the grain surface area (between the grain boundary and the inner grain) of the magnetic grains. The magnetic grains are isolated by SiN and magnetic grain interactions are reduced as Cr or SiN content is increased. Increasing the SiN volume fraction increases the thermal stability of the film. We found the [(FePt)/sub 90/-Cr/sub 10/]/sub 85/-(SiN)/sub 15/ film, annealed at 600/spl deg/C for 30 min, is suitable for high-density magnetic recording. Average grain size of the FePtCr in this film is about 9.5 nm. Its in-plane coercivity H/sub c/// is 3.7 kOe, saturation magnetization M/sub s/ is 450 emu/cm/sup 3/, and in-plane squareness S/sub /// is about 0.75.
Sponsorship	IEEE Magnetics Society
Starting Page	584
Ending Page	589
Page Count	6
File Size	613288
File Format	PDF
ISSN	00189464
Volume Number	39
Issue Number	1
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2003-01-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Chromium Silicon compounds Microstructure Magnetic films Soft magnetic materials Saturation magnetization Annealing Grain size Semiconductor thin films Substrates
Content Type	Text
Resource Type	Article
Subject	Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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