NDLI: Miniaturization of inductively coupled plasma sources

Content Provider	IEEE Xplore Digital Library
Author	Yin, Y. Messier, J. Hopwood, J.A.
Copyright Year	1973
Abstract	The scaling laws associated with the miniaturization of planar inductively coupled plasmas (ICPs) are investigated. The applications for miniature ICPs include microelectromechanical systems (MEMS) for chemical analysis and micro ion propulsion systems. Langmuir probe and microwave interferometry measurements of three ICPs with spiral-shaped coil diameters of 5, 10, and 15 mm show that electron density typically falls in the range of 10/sup 16/-10/sup 17/ m/sup -3/. The electron density is about an order of magnitude lower than large-scale ICPs as a result of the large surface-to-volume ratio of small discharges. The measured electron temperature is higher than predicted by a simple "global model" unless the plasma dimensions are determined more precisely by subtracting the sheath width from the chamber dimensions. Since the sheath width does not scale with the plasma size, the sheath width may ultimately limit the minimum size of ICPs. Plasma initiation power is determined to have a minimum at a gas pressure for which the electron collision frequency equals the frequency of the RF power supply. Small scale ICPs operating at 460 MHz can therefore be started most easily at /spl sim/1 torr. The design of the coil is critical to miniature ICP performance. Unlike large-scale ICPs that operate efficiently using a broad range of coil shapes, the miniature coil must be carefully designed and constructed to minimize parasitic resistance.
Sponsorship	IEEE Nuclear and Plasma Sciences Society
Starting Page	1516
Ending Page	1524
Page Count	9
File Size	380120
File Format	PDF
ISSN	00933813
Volume Number	27
Issue Number	5
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1999-10-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Plasma sources Plasma measurements Coils Electrons Plasma temperature Plasma sheaths Plasma density Large-scale systems Temperature measurement Frequency
Content Type	Text
Resource Type	Article
Subject	Nuclear and High Energy Physics Condensed Matter Physics

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