NDLI: Stochastic electron heating in a capacitive RF discharge with non-Maxwellian and time-varying distributions

Content Provider	IEEE Xplore Digital Library
Author	Wood, B.P. Lieberman, M.A. Lichtenberg, A.J.
Copyright Year	1973
Abstract	In capacitively coupled radio frequency discharges, the electrons gain and lose energy by reflection from oscillating, high voltage sheaths. When time-averaged, this results in stochastic heating, which at low pressure is responsible for most of the electron heating in these discharges. Previous derivations of stochastic heating rates have generally assumed that the electron distribution is a time-invariant, single-temperature Maxwellian, and that the sheath motion is slow compared to the average electron velocity, so that electrons gain or lose a small amount of energy in each sheath reflection. Here we solve for the stochastic heating rates in the opposite limit of fast sheath motion and consider the applicability of the slow and fast sheath equations in the intermediate region. We also consider the effect of a two-temperature Maxwellian distribution on particle balance and the effect of a time-varying temperature on the heating rates and densities.<>
Sponsorship	IEEE Nuclear and Plasma Sciences Society
Starting Page	89
Ending Page	96
Page Count	8
File Size	800635
File Format	PDF
ISSN	00933813
Volume Number	23
Issue Number	1
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1995-02-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Stochastic processes Electrons Heating Radio frequency Voltage Reflection Plasma sheaths Plasma temperature Temperature distribution US Department of Energy
Content Type	Text
Resource Type	Article
Subject	Nuclear and High Energy Physics Condensed Matter Physics

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