NDLI: Study of CoNbFe films deposited by DC magnetron sputtering

Content Provider	IEEE Xplore Digital Library
Author	Pan, G. Spencer, A.G. Howson, R.P.
Copyright Year	1965
Abstract	CoNbFe films were deposited by DC multisource sputtering and unbalanced DC single-magnetron sputtering. The film structures and magnetic properties were studied as a function of film composition and deposition parameters. Transmission electron microscopy study of the film structure and the measurement of film resistivity showed that films containing more than 12 at.% of Nb are amorphous, with a transition to crystalline films occurring in the 12-9-at.% range. The addition of small amounts of Fe reduces the H/sub c/ of the as-deposited films. For Co/sub 87-x/Nb/sub 13/Fe/sub x/ films, the optimum Fe content is 5.0 at.%. The minimum H/sub c/ of CoNbFe films made by the multisource was 17 A/m, with a large anisotropy field H/sub k/. Films made from a composite target on a single unbalanced magnetron had a minimum H/sub c/ of 6 A/m and a minimum H/sub k/ of 15 A/m. This is attributed to the low-energy and high-density ion bombardment of the growing films and the smaller angle of incidence from the single source.<>
Sponsorship	IEEE Magnetics Society
Starting Page	664
Ending Page	668
Page Count	5
File Size	765965
File Format	PDF
ISSN	00189464
Volume Number	27
Issue Number	1
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1991-01-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Sputtering Magnetic films Iron Amorphous magnetic materials Magnetic anisotropy Perpendicular magnetic anisotropy Niobium Magnetic properties Transmission electron microscopy Conductivity
Content Type	Text
Resource Type	Article
Subject	Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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