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  1. Volume Year : 1988 Num : 9
  2. Issue 4
  3. Microwave performance of InGaAs/InAlAs/InP SISFETs
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Issue 8
Issue 4
Microwave performance of InGaAs/InAlAs/InP SISFETs
Silicon-germanium base heterojunction bipolar transistors by molecular beam epitaxy
Excellent charge-trapping properties of ultrathin reoxidized nitrided oxides prepared by rapid thermal processing
5.2-GHz bandwidth monolithic GaAs optoelectronic receiver
Double-interdigitated (TIL) bipolar power transistors with lightly doped collectors
Operation of poly bipolar transistors near liquid-helium temperatures (9 K)
Yttrium oxide/silicon dioxide: a new dielectric structure for VLSI/ULSI circuits
Gate oxide charge-to-breakdown correlation to MOSFET hot-electron degradation
Deep-submicrometer MOS device fabrication using a photoresist-ashing technique
LDD MOSFETs using disposable sidewall spacer technology

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Microwave performance of InGaAs/InAlAs/InP SISFETs

Content Provider IEEE Xplore Digital Library
Author Feuer, M.D. Kuo, J.M. Shunk, S.C. Behringer, R.E. Chang, T.-Y.
Copyright Year 1980
Abstract Microwave S-parameter measurements and equivalent-circuit modeling of In/sub 0.53/Ga/sub 0.47/As/In/sub 0.52/Al/sub 0.48/As/InP semiconductor-insulator-semiconductor FETs (SISFETs) of 1.1- mu m gate length are discussed. The devices incorporated wide-bandgap buffers, self-aligned contact implants, and refractory air-bridge gates. Their DC I-V characteristics displayed sharp pinchoff, good output conductance of 10-20 mS/ss, and extrinsic transconductance up to 220 ms/mm at room temperature. The maximum unity-current-gain frequency was 27 GHz. Gate resistance was found to be the dominant factor limiting microwave power gain.<>
Sponsorship IEEE Electron Devices Society
Starting Page 162
Ending Page 164
Page Count 3
File Size 290351
File Format PDF
ISSN 07413106
Volume Number 9
Issue Number 4
Language English
Publisher Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date 1988-04-01
Publisher Place U.S.A.
Access Restriction One Nation One Subscription (ONOS)
Rights Holder Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword Indium gallium arsenide Indium compounds Indium phosphide Microwave measurements Length measurement FETs Implants Transconductance Temperature Frequency
Content Type Text
Resource Type Article
Subject Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering
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