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Content Provider | IEEE Xplore Digital Library |
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Author | Clegg, W. Pickard, R. |
Copyright Year | 1965 |
Abstract | Domain configurations in laminated magnetic film elements comprising two equal thickness layers of Permalloy separated by silicon monoxide are described. Individual layer thicknesses were in the range 15 to 200 nm. Elements with NiFe layers less than 100 nm thick show line domains and a locked domain structure on easy-axis field switching. These effects are attributed to magnetostatic effects between the laminations, as is the extended range of film thicknesses exhibiting Néel-type walls. In the range 90- to 200-nm NiFe thickness, anomalous domain propagation takes place, possibly the result of ordered growth of the upper magnetic layer. |
Sponsorship | IEEE Magnetics Society |
Starting Page | 929 |
Ending Page | 934 |
Page Count | 6 |
File Size | 994083 |
File Format | |
ISSN | 00189464 |
Volume Number | 5 |
Issue Number | 4 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 1969-12-01 |
Publisher Place | U.S.A. |
Access Restriction | One Nation One Subscription (ONOS) |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Magnetic films Magnetic separation Silicon Magnetic domains Magnetostatics Lamination Semiconductor films Substrates Optical films Coercive force |
Content Type | Text |
Resource Type | Article |
Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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