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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Meneghini, M. Rossetto, I. Bisi, D. Stocco, A. Chini, A. Pantellini, A. Lanzieri, C. Nanni, A. Meneghesso, G. Zanoni, E. |
| Copyright Year | 1963 |
| Abstract | This paper presents an extensive investigation of the properties of the trap with activation energy equal to 0.6 eV, which has been demonstrated to be responsible for current collapse (CC) in AlGaN/GaN HEMTs. The study was carried out on AlGaN/GaN HEMTs with increasing concentration of iron doping in the buffer. Based on pulsed characterization and drain current transient measurements, we demonstrate that for the samples under investigation: 1) increasing concentrations of Fe-doping in the buffer may induce a strong CC, which is related to the existence of a trap level located 0.63 eV below the conduction band energy and 2) this trap is physically located in the buffer layer, and is not related to the iron atoms but-more likely-to an intrinsic defect whose concentration depends on buffer doping. Moreover, we demonstrate that this level can be filled both under OFF-state conditions (by gate-leakage current) and under ON-state operation (when hot electrons can be injected to the buffer): for these reasons, it can significantly affect the switching properties of AlGaN/GaN HEMTs. |
| Sponsorship | IEEE Electron Devices Society |
| Starting Page | 4070 |
| Ending Page | 4077 |
| Page Count | 8 |
| File Size | 3061529 |
| File Format | |
| ISSN | 00189383 |
| Volume Number | 61 |
| Issue Number | 12 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2014-01-01 |
| Publisher Place | U.S.A. |
| Access Restriction | One Nation One Subscription (ONOS) |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Gallium nitride Logic gates MODFETs Doping Aluminum gallium nitride Electron traps HEMTs Transient analysis trap levels. Deep level transient spectroscopy (DLTS) defects gallium nitride high electron mobility transistor (HEMT) trap levels |
| Content Type | Text |
| Resource Type | Article |
| Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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