NDLI: Fabrication of an UltraLow-Resistance Ohmic Contact to MWCNT–Metal Interconnect Using Graphitic Carbon by Electron Beam-Induced Deposition (EBID)

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Fabrication of an UltraLow-Resistance Ohmic Contact to MWCNT–Metal Interconnect Using Graphitic Carbon by Electron Beam-Induced Deposition (EBID)

Content Provider	IEEE Xplore Digital Library
Author	Songkil Kim Kulkarni, D.D. Rykaczewski, K. Henry, M. Tsukruk, V.V. Fedorov, A.G.
Copyright Year	2002
Abstract	Reduction in contact resistance is one of the foremost challenges for carbon nanotube/graphene nanodevices. In this study, we present a novel fabrication process for low-temperature, Ohmic contact between open-ended multiwalled carbon nanotubes (MWCNTs) and metal interconnects using graphitic carbon deposited via electron beam-induced deposition (EBID). The electrical and structural properties of the contact interface are characterized for making connection to the single (outermost) shell only, as well as to multiple conducting shells of MWCNTs. In addition to establishing the scaling relationship between the carbon contact length and the resulting contact resistance, the magnitude of the contact resistance has been quantified with and without post-deposition thermal annealing. The results indicate that the contact is Ohmic in nature, and ranges from 26.5 kΩ for the connection made to the outermost shell of an MWCNT down to just 116 Ω for the multiple-shell connection performed via a process suggested through the EBID process simulations. These results provide a significant advance in application of MWCNTs to future interconnect technologies.
Sponsorship	IEEE Nanotechnology Council
Starting Page	1223
Ending Page	1230
Page Count	8
File Size	636884
File Format	PDF
ISSN	1536125X
Volume Number	11
Issue Number	6
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-11-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Carbon Resistance Metals Annealing Electron beams Contact resistance MWCNT–metal interconnect Contact resistances electron beam-induced deposition (EBID) multiwalled carbon nanotube (MWCNT)
Content Type	Text
Resource Type	Article
Subject	Nanoscience and Nanotechnology Electrical and Electronic Engineering Computer Science Applications

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