NDLI: Concave-Suspended High-<formula formulatype=inline><tex>$Q$</tex> </formula> Solenoid Inductors With an RFIC-Compatible Bulk-Micromachining Technology

Content Provider	IEEE Xplore Digital Library
Author	Lei Gu Xinxin Li
Copyright Year	1963
Abstract	Presented in this brief is a concave-suspended solenoid inductor that can be post-CMOS integrated into a low-resistivity silicon substrate using a novel radio frequency integrated circuit (RFIC)-compatible micromachining technology. The three-mask processes include photoresist spray coating, XeF₂ gaseous etching and copper electroplating, etc. The fabricated 11.5-turn inductor is measured with 2.96-nH inductance at 5.35 GHz, where the peak Q-factor is as high as about 45. Even with a compact layout (50% area occupation saved), the 8.5-turn inductor is still measured with 2.78 nH and peak Q of about 28 at 4.90 GHz. Both finite element simulation and shock testing results show that the suspended inductor is almost free of influence from environmental vibration and shock. Featuring high-Q performance and robust properties, the RFIC-compatible inductors are promising for high-performance RFIC applications
Sponsorship	IEEE Electron Devices Society
Starting Page	882
Ending Page	885
Page Count	4
File Size	343661
File Format	PDF
ISSN	00189383
Volume Number	54
Issue Number	4
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2007-04-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	solenoid inductors Bulk micromachining $Q$- factor radio frequency integrated circuit (RFIC)
Content Type	Text
Resource Type	Article
Subject	Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

High-$Q$ Solenoid Inductors With a CMOS-Compatible Concave-Suspending MEMS Process

A robust high-Q micromachined RF inductor for RFIC applications

CMOS-compatible surface-micromachined suspended-spiral inductors for multi-GHz silicon RF ICs

Significantly Enhanced Inductance and Quality Factor of GHz Integrated Magnetic Solenoid Inductors With FeGaB/ ${rm Al}_{2}{rm O}_{3}$ Multilayer Films

CMOS-compatible micromachined edge-suspended spiral inductors with high Q-factors and self-resonance frequencies

Performance Boost of Spiral Inductors With Thickness-Controlled Domain-Patterned Permalloy

The detailed analysis of high Q CMOS-compatible microwave spiral inductors in silicon technology

Robust and Postless Air-Suspended High Q Integrated Inductors on Silicon

A deep submicrometer CMOS process compatible high-Q air-gap solenoid inductor with laterally laid structure

Concave-Suspended High-$Q$ Solenoid Inductors With an RFIC-Compatible Bulk-Micromachining Technology

Similar Documents

High-$Q$ Solenoid Inductors With a CMOS-Compatible Concave-Suspending MEMS Process

A robust high-Q micromachined RF inductor for RFIC applications

CMOS-compatible surface-micromachined suspended-spiral inductors for multi-GHz silicon RF ICs

Significantly Enhanced Inductance and Quality Factor of GHz Integrated Magnetic Solenoid Inductors With FeGaB/ ${rm Al}_{2}{rm O}_{3}$ Multilayer Films

CMOS-compatible micromachined edge-suspended spiral inductors with high Q-factors and self-resonance frequencies

Performance Boost of Spiral Inductors With Thickness-Controlled Domain-Patterned Permalloy

The detailed analysis of high Q CMOS-compatible microwave spiral inductors in silicon technology

Robust and Postless Air-Suspended High Q Integrated Inductors on Silicon

A deep submicrometer CMOS process compatible high-Q air-gap solenoid inductor with laterally laid structure

Concave-Suspended High-$Q$ Solenoid Inductors With an RFIC-Compatible Bulk-Micromachining Technology