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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Olsen, S.H. Escobedo-Cousin, E. Varzgar, J.B. Agaiby, R. Seger, J. Dobrosz, P. Chattopadhyay, S. Bull, S.J. O'Neill, A.G. Hellstrom, P.-E. Edholm, J. Ostling, M. Lyutovich, K.L. Oehme, M. Kasper, E. |
| Copyright Year | 1963 |
| Abstract | This paper presents the first results and analysis of strained Si n-channel MOSFETs fabricated on thin SiGe virtual substrates. Significant improvements in electrical performance are demonstrated compared with Si control devices. The impact of SiGe device self-heating is compared for strained Si MOSFETs fabricated on thin and thick virtual substrates. This paper demonstrates that by using high-quality thin virtual substrates, the compromised performance enhancements commonly observed in short-gate-length MOSFETs and high-bias conditions due to self-heating in conventional thick virtual substrate devices are eradicated. The devices were fabricated with a 2.8-nm gate oxide and included NiSi to reduce the parasitic series resistance. The strained layers grown on the novel substrates comprising 20% Ge did not relax during fabrication. Good on-state performance, off-state performance, and cross-wafer uniformity are demonstrated. The results show that thin virtual substrates have the potential to circumvent the major issues associated with conventional virtual substrate technology. A promising solution for realizing high-performance strained Si devices suitable for a wide range of applications is thus presented |
| Sponsorship | IEEE Electron Devices Society |
| Starting Page | 2296 |
| Ending Page | 2305 |
| Page Count | 10 |
| File Size | 457737 |
| File Format | |
| ISSN | 00189383 |
| Volume Number | 53 |
| Issue Number | 9 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2006-09-01 |
| Publisher Place | U.S.A. |
| Access Restriction | One Nation One Subscription (ONOS) |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | virtual substrate MOSFETs self-heating silicon germanium strained silicon |
| Content Type | Text |
| Resource Type | Article |
| Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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