NDLI: Thin and thick films of metal oxides and metal phthalocyanines as gamma radiation dosimeters

Content Provider	IEEE Xplore Digital Library
Author	Arshak, K. Arshak, A. Zleetni, S. Korostynska, O.
Copyright Year	1963
Abstract	Numerous efforts were devoted to investigating the influence of radiation on metal oxides and polymer materials for dosimetry applications. Metal oxides, such as NiO, LaFeO/sub 3/, CeO/sub 2/, TeO/sub 2/, In/sub 2/O/sub 3/, SiO and MnO, and polymers, such as CuPc, NiPc, MnPc and CoPc, were used as the active constituents in the fabrication of /spl gamma/-radiation sensors. Thin and thick film devices were made in various topologies to form resistors, capacitors, pn-junctions and transistors. It was found that the properties of the active films (and, hence, their sensitivity to radiation) could be controlled by doping their constituent materials with carbon and mixing them in different proportions. The /sup 60/Co and /sup 137/Cs sources were used to expose the samples to /spl gamma/-radiation. Current-voltage characteristics, optical absorption spectra, Raman spectra, SEM and XRD measurements were recorded for the samples after each exposure procedure and values of radiation damage were estimated. Thin film devices were found to be more sensitive to radiation than their thick film counterparts. Annealing was used to restore the properties of thick film devices after they were damaged with radiation. Thick films could be therefore reused on a repeatable basis, but thin film devices could not, as the heat treatments necessary for annealing were found to cause diffusion of the electrode materials. In this work, the possibility of fabricating a device that would satisfy the requirement of a particular application, such as sensitivity to /spl gamma/-radiation and working dose region, was experimentally demonstrated. Based on the findings, these devices were found to provide a cost-effective alternative for room temperature real time /spl gamma/-radiation dosimeter applications.
Sponsorship	IEEE Nuclear and Plasma Sciences Society Computer Applications in Nuclear and Plasma Sciences (CANPS) Lawrence Berkeley Lab. Lawrence Livermore Nat. Lab. APS College of William and Mary Continuous Electron Beam Accelerator Facility NASA Defence Nuclear Agency Sandia National Laboratories Jet Propulsion Laboratory Brookhaven Nat. Lab. Lawrence Livermore Nat. Lab IEEE/NPPS Radiat. Effects Committee Defence Nuclear Agency/DoD Sandia National Laboratories/DOE Jet Propulsion Laboratory/NASA Phillips Lab./DoD
Starting Page	2250
Ending Page	2255
Page Count	6
File Size	235300
File Format	PDF
ISSN	00189499
Volume Number	51
Issue Number	5
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2004-10-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Thick films Gamma rays Polymers Thick film devices Optical films Thin film devices Annealing Inorganic materials Dosimetry Fabrication
Content Type	Text
Resource Type	Article
Subject	Nuclear and High Energy Physics Electrical and Electronic Engineering Nuclear Energy and Engineering

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