NDLI: Characterization of a silicon thermal gas-flow sensor with porous silicon thermal isolation

Content Provider	IEEE Xplore Digital Library
Author	Kaltsas, G. Nassiopoulos, A.A. Nassiopoulou, A.G.
Copyright Year	2001
Abstract	In this paper, the results of full characterization of a micromachined-silicon thermal gas flow sensor will be presented. The sensor is composed of two series of thermocouples on the right and left side of a polysilicon resistor, used as heater. The resistor and the hot contacts of the thermocouples lie on a thick porous silicon layer, which assures local thermal isolation, while the thermopile cold contacts lie on bulk silicon. Gas flow is parallel to the surface of the sensor and perpendicular to the resistor, which is heated at constant temperature. The power of the heater is stabilized by an external circuit, which provides a feedback current to compensate changes in the resistance of the heater under flow. Characterization of the sensor both under static conditions and under flow of different gases will be presented. The sensor shows high sensitivity [of the order of 175 /spl times/ 10/sup -3/ mV/(m/s)/sup 1/2/ per thermocouple] and very rapid response, below 1 ms, which makes it appropriate for use both under laminar and under turbulent flows.
Sponsorship	IEEE Sensors Council
Starting Page	463
Ending Page	475
Page Count	13
File Size	1218529
File Format	PDF
ISSN	1530437X
Volume Number	2
Issue Number	5
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2002-10-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Silicon Sensor phenomena and characterization Thermal sensors Resistors Fluid flow Gas detectors Temperature sensors Thermal resistance Surface resistance Feedback circuits
Content Type	Text
Resource Type	Article
Subject	Instrumentation Electrical and Electronic Engineering

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