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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Sandoz, P. Ravassard, J.C. Dembele, S. Janex, A. |
| Copyright Year | 1963 |
| Abstract | This paper presents a vision technique for position and displacement measurement of moving targets. An adapted phase reference pattern is fixed to the object to be controlled and allows the location of the object in the scene observed by a static camera with an accuracy better than 10/sup -2/ pixel. The phase reference pattern is scaled as a function of the desired field of observation and position accuracy. Then the system measurement performances can be chosen from the nanometer to the millimeter ranges (or even larger). Furthermore, the method is self calibrating in length, since the phase reference pattern includes its own length reference. Drifts in vision system magnification therefore do not affect the measurement accuracy. Applications can be used in different fields, for instance, the position control of masks and wafers in photolithography processes or the servo-control of micro-robots. |
| Sponsorship | IEEE Instrumentation and Measurement Society Bureau international des poids et mesures IEEE International Bureau of Weights and Measures (BIPM) URSI NBS Agency Ind. Sci. & Technol., Min. Int. Trade & Ind. Sci. Council Japan International Union of Pure and Applied Physics (IUPAP) NIST NRCC National Conference of Standards Laboratories (NCSL) Allen Osborne Associates Andeen-Hagerling, Inc. Ballantine Lab. Inc. Clarke-Hess Communications Research Corp. Fluke Corporation Guildline Instruments Hewlett-Packard Co. Julie Res. Lab. Inc. Keithley Instruments, Inc. Measurements International Ltd. Canada QuadTech Inc. Quantum Design Inc. Rotek Instrum. Corp. Tegam Inc. Tektronix Inc |
| Starting Page | 867 |
| Ending Page | 872 |
| Page Count | 6 |
| File Size | 148377 |
| File Format | |
| ISSN | 00189456 |
| Volume Number | 49 |
| Issue Number | 4 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2000-08-01 |
| Publisher Place | U.S.A. |
| Access Restriction | One Nation One Subscription (ONOS) |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Position measurement Strips Displacement measurement Machine vision Wavelet transforms Layout Cameras Wavelet analysis Optical distortion Optical interferometry |
| Content Type | Text |
| Resource Type | Article |
| Subject | Instrumentation Electrical and Electronic Engineering |
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