NDLI: An optimization design method for chemically amplified resist process control

Content Provider	IEEE Xplore Digital Library
Author	Pan, S. Reilly, M.T. Di Fabrizio, E. Leonard, Q. Taylor, J.W. Cerrina, F.
Copyright Year	1988
Abstract	A novel optimization method called chemically-amplified resist process optimization design (CARPOD) applicable to the chemically amplified resist (CAR) process development is described. The method finds the optimal process conditions and the design center (maximum process tolerance space) of a CAR process with minimum experimental runs. First a modified response surface method is used to form the numerical response surface of a CAR, and its most sensitive point, which is the minimum requirement of X-ray dose, is located as an optimal process condition by an optimization method called POSM under the constraint of the contrast of the photoresist. Second, the design center is found to maximize the process tolerance space around the optimal process condition. Third, verifications are made on the optimal design as well as the design center. The process optimization of AZ PF-514 has been used as an example to show that the CARPOD method can identify the optimal process condition as well as the maximum tolerable parameter space with minimum experimental runs.<>
Sponsorship	IEEE Electron Devices Society IEEE Components, Packaging, and Manufacturing Technology Society IEEE Reliability Society IEEE Solid-State Circuits Society
Starting Page	325
Ending Page	332
Page Count	8
File Size	1001521
File Format	PDF
ISSN	08946507
Volume Number	7
Issue Number	3
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1994-08-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Design optimization Design methodology Chemical processes Resists Process control Response surface methodology Design for experiments Optimization methods Process design Lithography
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Condensed Matter Physics Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
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9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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