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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Yamashita, S. Ikeda, M. Hara, K. |
| Copyright Year | 1985 |
| Abstract | Garnet films have the low saturation flux density characteristics required for use in the ring head gap sections of hybrid heads. Conditions for preparation of garnet films by the RF sputter technique were studied. Oxygen density, annealing time, and power supplied were the most important film formation factors, while target material composition was also significant, with a critical level of 5 percent. It was found that annealing from 950°C for 30 min after film growth under 50 W applied power in an argon atmosphere including 2 percent oxygen produced the best garnet film with characteristics close to those of bulk material. |
| Starting Page | 671 |
| Ending Page | 672 |
| Page Count | 2 |
| File Size | 224004 |
| File Format | |
| ISSN | 08824959 |
| Volume Number | 2 |
| Issue Number | 7 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1987-07-01 |
| Publisher Place | Hiroshima, Japan |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Garnet films Annealing Magnetic materials Magnetic heads Oxygen Power supplies Radio frequency Argon Substrates Magnetic analysis |
| Content Type | Text |
| Resource Type | Article |
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