NDLI: The Behavior of Surface Oxide Film on Ruthenium and Rhodium Plated Contacts

Content Provider	IEEE Xplore Digital Library
Author	Umemoto, T. Takeuchi, T. Tanaka, R.
Copyright Year	1978
Abstract	Although a surface oxide film on platinum-metal contacts is effective in preventing these contacts from polymerizing organic materials, it causes an increase in contact resistance. It is important to determine the thickness of surface oxide film which effectly prevents organic polymerization without causing a significant increase in contact resistance. Auger Electron Spectroscopy is used here to determine the thicknesses of the surface oxide films formed on Ru and Rh plated contacts at various temperatures in synthetic air. These are compared with results for untreated Ru and plated Rh contacts. Contact voltage versus contact resistance and contact force versus contact resistance characteristics of plated Ru and Ru oxidized after plating are measured by the crossed-rod method to study the relationship between contact resistance and thickness of a surface oxide film. The extent of organic polymerization on Ru and Rh plated contacts is determined by operating the contacts unloaded (dry) and monitoring the contact resistance after the treated and untreated contacts are exposed to benzene vapor. !t is found that, when the surface of the contacts is covered by a thin oxide film in either the case of plated Ru or plated Rh, the contact resistance can be low and stable, whereas contacts cleaned by Ar+ bombardment prior to sealing will be high in resistance. From these experimental results, it is determined that the thickness range of surface oxide film which prevents polymerizing without any measurable increase in contact resistance is approximately 5A ~25A.
Sponsorship	IEEE Electronic Industries Alliance American Society of Mechanical Engineering (ASME) NBS SAE
Starting Page	103
Ending Page	107
Page Count	5
File Size	574009
File Format	PDF
ISSN	01486411
Volume Number	1
Issue Number	1
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1978-03-01
Publisher Place	U.S.A.
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Contact resistance Surface resistance Polymer films Force measurement Electrical resistance measurement Thickness measurement Surface treatment Organic materials Electrons Spectroscopy
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Electronic, Optical and Magnetic Materials Engineering Electrical and Electronic Engineering

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in