NDLI: Maskless Patterning by Pulsed-Power Plasma Printing

Content Provider	IEEE Xplore Digital Library
Author	Huiskamp, T. Brok, W.J.M. Stevens, A.A.E. van Heesch, E.J.M. Pemen, A.J.M.
Copyright Year	1973
Abstract	In this paper, pulsed-power technology was applied to plasma printing, which is a maskless plasma patterning solution that is being developed for the fabrication process of printed electronics. A high-voltage pulse source was developed and applied to a high-speed plasma printer to improve the speed of plasma printing. Experiments on plasma printing were used to compare the performance of the pulse source with the currently used alternating-current source. From plasma experiments, an electrical plasma model was derived for the plasma printer. Different parameters were investigated, such as the plasma energy as a function of gap distance, applied voltage, and the total amount of plasma that was generated. From these experiments, a connection was made between the plasma energy and the print effectiveness to arrive at optimal parameter values for fast plasma printing. It was concluded that higher plasma energy leads to higher print effectiveness, which leads to an increase in plasma print speed by a factor of 10 when using the pulse source. Moreover, scaling the PlasmaPint technology to reach higher print speeds is achievable by using more print heads or print heads with more tips.
Sponsorship	IEEE Nuclear and Plasma Sciences Society
Starting Page	1913
Ending Page	1925
Page Count	13
File Size	1288600
File Format	PDF
ISSN	00933813
Volume Number	40
Issue Number	7
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-07-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Plasmas Switches Printing Printers MOSFET circuits Inductors Logic gates pulsed-power supply Dielectric barrier discharge (DBD) plasma printed electronics
Content Type	Text
Resource Type	Article
Subject	Nuclear and High Energy Physics Condensed Matter Physics

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
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3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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