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Peeled film gaas solar cells for space power
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Author | Bailey, S. G. Brinker, D. J. Landis, G. A. Fatemi, N. S. Thomas, R. D. Deangelo, F. L. Wilt, D. M. |
| Copyright Year | 1990 |
| Description | Gallium arsenide (GaAs) peeled film solar cells were fabricated, by Organo-Metallic Vapor Phase Epitaxy (OMVPE), incorporating an aluminum arsenide (AlAs) parting layer between the device structure and the GaAs substrate. This layer was selectively removed by etching in dilute hydrofloric (HF) acid to release the epitaxial film. Test devices exhibit high series resistance due to insufficient back contact area. A new design is presented which uses a coverglass superstrate for structural support and incorporates a coplanar back contact design. Devices based on this design should have a specific power approaching 700 W/Kg. |
| File Size | 403079 |
| Page Count | 10 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_19900011971 |
| Archival Resource Key | ark:/13960/t0sr3s906 |
| Language | English |
| Publisher Date | 1990-05-01 |
| Access Restriction | Open |
| Subject Keyword | Electronics And Electrical Engineering Solar Cells Gallium Arsenides Life Durability Cost Reduction Planar Structures Spacecraft Power Supplies Etching Substrates Thin Films Fabrication Vapor Phase Epitaxy Aluminum Arsenides Energy Conversion Efficiency Ntrs Nasa Technical Reports ServerĀ (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Technical Report |