Loading...
Please wait, while we are loading the content...
Development of megasonic cleaning for silicon wafers
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Author | Mayer, A. |
| Copyright Year | 1980 |
| Description | A cleaning and drying system for processing at least 2500 three in. diameter wafers per hour was developed with a reduction in process cost. The system consists of an ammonia hydrogen peroxide bath in which both surfaces of 3/32 in. spaced, ion implanted wafers are cleaned in quartz carriers moved on a belt past two pairs of megasonic transducers. The wafers are dried in the novel room temperature, high velocity air dryer in the same carriers used for annealing. A new laser scanner was used effectively to monitor the cleaning ability on a sampling basis. |
| File Size | 11528432 |
| Page Count | 96 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_19810011042 |
| Archival Resource Key | ark:/13960/t3tt9f479 |
| Language | English |
| Publisher Date | 1980-09-01 |
| Access Restriction | Open |
| Subject Keyword | Energy Production And Conversion Thin Films Solar Cells Semiconductor Devices Solar Energy Conversion Wafers Low Cost Ultrasonic Cleaning Energy Policy Microelectronics Surface Finishing Ntrs Nasa Technical Reports Server (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Technical Report |
