NDLI: Rates and mechanisms of the atomic oxygen reaction with nickel at elevated temperatures

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Rates and mechanisms of the atomic oxygen reaction with nickel at elevated temperatures

Content Provider	NASA Technical Reports Server (NTRS)
Author	Gilbreath, W. P. Christian, J. D.
Copyright Year	1973
Description	The oxidation of nickel by atomic oxygen at pressure from 1 to 45 N/sq m between 1050 and 1250 K was investigated. In these ranges, the oxidation was found to follow the parobolic rate law, viz., K sub p = 0.0000114 exp(-13410/T) g squared/cm4/sec for films of greater than 1 micron thickness and was pressure independent. The activation enthalpy for the oxidation reaction was 112 + or - 11 kj/mole (27 + or - 3 kcal/mole). Of a number of possible mechanisms and defect structures considered, it was shown that the most likely was a saturated surface defect model for atomic oxidation, based on reaction activation enthalpies, impurity effects, pressure independence, and magnitudes of rates. A model judged somewhat less likely was one having doubly ionized cationic defects rate controlling in both atomic and molecular oxygen. From comparisons of the appropriate processes, the following enthalpy values were derived: enthalpy of activation (Ni diffusion in Ni0) = 110 + or - 30 kj/mole and standard enthalpy change for reaction formation (doubly ionized cation vacancies in Ni0 from atomic oxygen)= -9 + or - 25 kj/mole.
File Size	1994416
Page Count	36
File Format	PDF
Alternate Webpage(s)	http://archive.org/details/NASA_NTRS_Archive_19730020792
Archival Resource Key	ark:/13960/t6353ds4f
Language	English
Publisher Date	1973-08-01
Access Restriction	Open
Subject Keyword	Materials, Metallic Ionization Enthalpy Reaction Kinetics High Temperature Research Oxidation Nickel Cations Diffusion Ntrs Nasa Technical Reports Server (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science
Content Type	Text
Resource Type	Technical Report

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