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Effects of surface polishing on the microstrain behavior of telescope mirror materials
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Author | Woods, W. W. Eul, W. A. |
| Copyright Year | 1973 |
| Description | Rough ground silicic mirror substrate materials were found in previous investigations to exhibit significant surface yield. This effect was removed by surface etching, a procedure not normally employed in the finishing of optical telescope mirrors. The effects of fine grinding and polishing techniques as well as graded etching are investigated. Torsional shear measurements of yield strain versus stress are made on four candidate mirror substrate materials: polycrystalline silicon, ULE silica 7971, CER-VIT 101, and fused silica 7940. Commonly employed fine grinding and polishing practices are shown to remove a major portion of the surface yield found in rough ground mirror substrate materials. |
| File Size | 1817099 |
| Page Count | 35 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_19730008920 |
| Archival Resource Key | ark:/13960/t1qg3gd92 |
| Language | English |
| Publisher Date | 1973-01-01 |
| Access Restriction | Open |
| Subject Keyword | Materials, Nonmetallic Reflecting Telescopes Silicides Polishing Etching Surface Roughness Grinding Material Removal Crystallinity Mirrors Substrates Ntrs Nasa Technical Reports ServerĀ (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Technical Report |