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New method for photoresist stripping
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Copyright Year | 1970 |
| Description | Vacuum dehydration of negatively working photoresist eliminates trace contamination of conventional stripping methods. The semiconductor substrate is coated with photoresist, exposed, developed, cured, and etched, and then placed in a vacuum. Following dehydration, the resist film is removable with ordinary solvents. |
| File Size | 75274 |
| Page Count | 1 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_19700000479 |
| Archival Resource Key | ark:/13960/t2w42h98n |
| Language | English |
| Publisher Date | 1970-09-01 |
| Access Restriction | Open |
| Subject Keyword | Materials Ntrs Nasa Technical Reports ServerĀ (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Technical Report |