NDLI: Interface tailoring through the supply of optimized oxygen and hydrogen to semiconductors for highly stable top-gate-structured high-mobility oxide thin-film transistors.

Content Provider	Europe PMC
Author	Ko, Jong Beom Lee, Seung-Hee Park, Kyung Woo Park, Sang-Hee Ko
Copyright Year	2019
Page Count	8
Journal	RSC Advances
Volume Number	9
PubMed Central reference number	PMC9075037
Issue Number	62
PubMed reference number	35540589
e-ISSN	20462069
DOI	10.1039/c9ra06960g
Language	English
Publisher	The Royal Society of Chemistry
Publisher Date	2019-11-07
Access Restriction	Open
Rights License	This journal is © The Royal Society of Chemistry
Content Type	Text
Resource Type	Article
Subject	Chemistry Chemical Engineering

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