Loading...
Please wait, while we are loading the content...
Similar Documents
Conformal Growth of Nanometer-Thick Transition Metal Dichalcogenide TiS x -NbS x Heterostructures over 3D Substrates by Atomic Layer Deposition: Implications for Device Fabrication.
| Content Provider | Europe PMC |
|---|---|
| Author | Basuvalingam, Saravana Balaji Bloodgood, Matthew A. Verheijen, Marcel A. Kessels, Wilhelmus M. M. Bol, Ageeth A. |
| Copyright Year | 2021 |
| Abstract | The scalable andconformal synthesis of two-dimensional (2D) transitionmetal dichalcogenide (TMDC) heterostructures is a persisting challengefor their implementation in next-generation devices. In this work,we report the synthesis of nanometer-thick 2D TMDC heterostructuresconsisting of TiSx-NbSx on both planar and 3D structures using atomic layer deposition(ALD) at low temperatures (200–300 °C). To this end, aprocess was developed for the growth of 2D NbSx by thermal ALD using (tert-butylimido)-tris-(diethylamino)-niobium(TBTDEN) and H2S gas. This process complemented the TiSx thermal ALD process for the growth of 2D TiSx-NbSx heterostructures.Precise thickness control of the individual TMDC material layers wasdemonstrated by fabricating multilayer (5-layer) TiSx-NbSx heterostructures withindependently varied layer thicknesses. The heterostructures weresuccessfully deposited on large-area planar substrates as well asover a 3D nanowire array for demonstrating the scalability and conformalityof the heterostructure growth process. The current study demonstratesthe advantages of ALD for the scalable synthesis of 2D heterostructuresconformally over a 3D substrate with precise thickness control ofthe individual material layers at low temperatures. This makes theapplication of 2D TMDC heterostructures for nanoelectronics promisingin both BEOL and FEOL containing high-aspect-ratio 3D structures. |
| Related Links | https://europepmc.org/backend/ptpmcrender.fcgi?accid=PMC7885689&blobtype=pdf |
| Journal | ACS Applied Nano Materials [ACS Appl Nano Mater] |
| Volume Number | 4 |
| DOI | 10.1021/acsanm.0c02820 |
| PubMed Central reference number | PMC7885689 |
| Issue Number | 1 |
| PubMed reference number | 33615158 |
| e-ISSN | 25740970 |
| Language | English |
| Publisher | American Chemical Society |
| Publisher Date | 2021-01-04 |
| Access Restriction | Open |
| Rights License | This is an open access article published under a Creative Commons Non-Commercial No Derivative Works (CC-BY-NC-ND) Attribution License, which permits copying and redistribution of the article, and creation of adaptations, all for non-commercial purposes. © 2021 The Authors. Published by AmericanChemical Society |
| Subject Keyword | ALD transition metal dichalcogenides titaniumdisulfide niobium disulfide thin films heterostructure conformality |
| Content Type | Text |
| Resource Type | Article |
| Subject | Materials Science |