Anti-reflective nano- and micro-structures on 4H-SiC for photodiodes.

Content Provider	Europe PMC
Author	Kang, Min-Seok Joo, Sung-Jae Bahng, Wook Lee, Ji-Hoon Kim, Nam-Kyun Koo, Sang-Mo
Copyright Year	2011
Abstract	In this study, nano-scale honeycomb-shaped structures with anti-reflection properties were successfully formed on SiC. The surface of 4H-SiC wafer after a conventional photolithography process was etched by inductively coupled plasma. We demonstrate that the reflection characteristic of the fabricated photodiodes has significantly reduced by 55% compared with the reference devices. As a result, the optical response Iillumination/Idark of the 4H-SiC photodiodes were enhanced up to 178%, which can be ascribed primarily to the improved light trapping in the proposed nano-scale texturing.
ISSN	19317573
Journal	Nanoscale Research Letters
Volume Number	6
PubMed Central reference number	PMC3211295
Issue Number	1
PubMed reference number	21711744
e-ISSN	1556276X
DOI	10.1186/1556-276x-6-236
Language	English
Publisher	Springer
Publisher Date	2011-03-18
Access Restriction	Open
Rights License	This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. Copyright ©2011 Kang et al; licensee Springer.
Content Type	Text
Resource Type	Article
Subject	Nanoscience and Nanotechnology Condensed Matter Physics Materials Science