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Tin inventory for HVM EUVL sources
| Content Provider | CiteSeerX |
|---|---|
| Author | Richardson, Martin C. Takenoshita, Kazutoshi Schmid, Tobias |
| Abstract | Tin is one of the most efficient source materials for both gas discharge plasma sources and laser produced plasma sources for EUV lithography. Unlike Xenon which was the material commonly investigated for the EUVL source application, recycling of the target materials is not necessary for tin targets because of its low relative cost. However, in assessing the benefits of different source architectures, there are large differences in the size of the tin inventory used, and consequences that ensue. In this paper we make a first attempt to compare these dif-ferences, and assess their impact. Utilizing tin as the radiator at 13.5 nm reduces the total cost of the source system significantly. |
| File Format | |
| Access Restriction | Open |
| Subject Keyword | Tin Inventory Hvm Euvl Source First Attempt Different Source Architecture Gas Discharge Plasma Source Euv Lithography Efficient Source Material Target Material Euvl Source Application Tin Target Plasma Source Nm Reduces Large Difference Source System Low Relative Cost Total Cost |
| Content Type | Text |
| Resource Type | Article |
