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Fabrication of High-Aspect-Ratio Metallic Nanostructures Using Nanoskiving (2006)
| Content Provider | CiteSeerX |
|---|---|
| Author | Xu, Qiaobing Perez-Castillejos, Raquel Li, Zhefeng Whitesides, George M. |
| Abstract | This communication describes the fabrication of gold structures (for example, rings) with wall thickness of 40 nm, and with high aspect ratios up to 25. This technique combines thin-film deposition of metal on a topographically patterned epoxy substrate, with nanometer-scale sectioning using a microtome in a plane parallel to the patterned substrate. The dimensions of the metal structures are determined by the thickness of the metal film and the thickness of the epoxy sections. The shape of the resulting nanostructure is defined by the cross section of the original template. This paper describes the fabrication of gold nanostructures with high aspect ratios using a combination of thin-film deposition and a technique developed recently based on sectioning with a microtome (which we call “nanoskiving”).1 The dimensions of the resulting nanostructures are controlled by the thickness of the metal film and the thickness of the epoxy sections. The shape of the nanostructure is defined by the geometry of the template. High-aspect-ratio microstructures have been used as the |
| File Format | |
| Publisher Date | 2006-01-01 |
| Access Restriction | Open |
| Subject Keyword | High-aspect-ratio Metallic Nanostructures Using Nanoskiving Thin-film Deposition Epoxy Section Metal Film Original Template Plane Parallel Gold Structure Cross Section High-aspect-ratio Microstructures Resulting Nanostructure High Aspect Ratio Metal Structure Patterned Substrate Wall Thickness Epoxy Substrate High Aspect Gold Nanostructures Resulting Nanostructures |
| Content Type | Text |
| Resource Type | Article |
