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Application of cluster tool modeling to a 300 mm fab simulation (2003).
| Content Provider | CiteSeerX |
|---|---|
| Author | Chick, S. Sánchez, P. J. Macnair, Edward A. Ferrin, D. Morrice, D. J. Shikalgar, Sameer T. Fronckowiak, David |
| Abstract | mm semiconductor wafer fabrication facilities, like conventional semiconductor fabs, contain many different types of tools. In this paper we discuss a realistic way of representing cluster tools in a simulation model of the entire line. A more realistic representation of cluster tools results in greater accuracy in the output of the simulation model. |
| File Format | |
| Publisher Date | 2003-01-01 |
| Access Restriction | Open |
| Subject Keyword | Mm Fab Simulation Cluster Tool Modeling Simulation Model Conventional Semiconductor Fabs Cluster Tool Realistic Way Entire Line Mm Semiconductor Wafer Fabrication Facility Cluster Tool Result Many Different Type Realistic Representation |
| Content Type | Text |
| Resource Type | Article |