Loading...
Please wait, while we are loading the content...
Similar Documents
Modeling and analysis of scatterometry signatures for optical critical dimension reference material applications.
| Content Provider | CiteSeerX |
|---|---|
| Author | Patrick, Heather J. Germer, Thomas A. Cresswell, Michael W. Allen, Richard A. Dixson, Ronald G. Bishop, Michael |
| Abstract | Abstract. We use an optical critical dimension (OCD) technique, matching modeled to measured scatterometry signatures, to obtain critical dimension linewidth of lines in grating targets fabricated on SIMOX (separation by implantation of oxygen) substrates using the single-crystal critical dimension reference materials (SCCDRM) process. We first compare experimentally obtained reflectance signatures for areas of the unpatterned substrate with signatures modeled using Fresnel theory, and show that the buried oxide (BOX) layer of the SIMOX is not well described optically by a single homogeneous layer of SiO2, but can be so described if a mixed Si-SiO2 boundary layer is included between the Si wafer and the BOX layer. We then obtain linewidths from OCD measurements on a series of grating targets with a range of design linewidths and pitches, and show that the linewidth obtained from the OCD technique is linearly related to the linewidth obtained from scanning electron microscopy (SEM), with a slope near unity and zero offset. While these results are very promising, further work in improving the fit of the simulated signatures to the measured signatures for some of the targets, reducing the target line roughness, and analyzing the uncertainties for potential optical critical dimension reference materials, is anticipated. |
| File Format | |
| Access Restriction | Open |
| Subject Keyword | Scatterometry Signature Electron Microscopy Fresnel Theory Critical Dimension Linewidth Ocd Measurement Design Linewidths Simulated Signature Zero Offset Target Line Roughness Box Layer Mixed Si-sio2 Boundary Layer Ocd Technique Reflectance Signature Single Homogeneous Layer Optical Critical Dimension Single-crystal Critical Dimension Reference Material Si Wafer Unpatterned Substrate |
| Content Type | Text |
| Resource Type | Article |
