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Microstructure and surface morphology of ysz thin films deposited by e-beam technique applied surface science 254/10 2008.
| Content Provider | CiteSeerX |
|---|---|
| Author | Laukaitis, Giedrius Galdikas, Arvaidas Čerepaitė-Trušinskienė, Reda Dudonis, Julius Milčius, Darius |
| Abstract | In present study yttrium stabilized zirconia (YSZ) thin films were deposited on Alloy-600 (Ni72/Cr16/Fe8) and optical quartz substrates using e-beam deposition technique controlling deposition parameters: substrate temperature and electron gun power influencing thin film deposition mechanism. The dependences of thin film structure and surface morphology on these parameters were investigated by X-ray diffraction, scanning electron microscopy (SEM), and atomic force microscopy (AFM). It was found that electron gun power influence the crystallite size and roughness of the YSZ films. YSZ thin film formation and evolution of surface roughness were analyzed for clarification of the experimental results by a kinetic model. The model is based on rate equations and includes processes of surface diffusion of adatoms, nucleation, growth, and coalescence of clusters. Analysis of experimental results done by modeling explains non-monotonous dependence of surface roughness on substrate temperature and electron gun power which is resulted by diffusivity of adatoms and the size of clusters. |
| File Format | |
| Access Restriction | Open |
| Subject Keyword | Surface Morphology E-beam Technique Applied Surface Science Ysz Thin Film Surface Roughness Substrate Temperature Electron Gun Power Experimental Result Surface Diffusion Present Study Yttrium Explains Non-monotonous Dependence Thin Film Deposition Mechanism Electron Microscopy Deposition Parameter Electron Gun Power Influence Ysz Film Ysz Thin Film Formation Optical Quartz X-ray Diffraction Thin Film Structure Crystallite Size E-beam Deposition Technique Ni72 Cr16 Fe8 Kinetic Model Atomic Force Microscopy Rate Equation |
| Content Type | Text |