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Pii: s0040-6090 ž01.01482-1 growth of nio and mgo films on ag(100).
| Content Provider | CiteSeerX |
|---|---|
| Author | Wollschlager, J. Erdos, D. Goldbach, H. Hopken, R. Schroder, K. M. |
| Abstract | The growth morphology of NiO and MgO films deposited in the temperature range 300–350 K has been studied by Spot Profile Analysis of Low Energy Electron Diffraction (SPA-LEED) patterns. The oxide films grow layer-by-layer. They are pseudomorphic during the initial stages. Relaxation via the injection of misfit dislocations with {110} glide planes occurs for coverages larger than a critical coverage (Q f5 ML for NiO, Q s1–2 ML for MgO). The relaxation process leads to thec c formation of mosaics on the film surface. The tilt angle of the mosaics decreases with increasing oxide thickness due to minimisation of the deformation energy. 2001 Elsevier Science B.V. All rights reserved. |
| File Format | |
| Access Restriction | Open |
| Subject Keyword | Mgo Film 01482-1 Growth Elsevier Science B.v. Right Growth Morphology Spot Profile Analysis Deformation Energy Misfit Dislocation Relaxation Process Tilt Angle Temperature Range Oxide Thickness Critical Coverage Oxide Film Low Energy Electron Diffraction Glide Plane Initial Stage Film Surface |
| Content Type | Text |
