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A path to nanolithography (1996)
| Content Provider | CiteSeerX |
|---|---|
| Author | Cerrina, F. Marrian, C. |
| Description | XXI: 56–62 The goal of nanolithography is the delivery of sub-100 nm patterns. While the semiconductor industry struggles with the issues created by the end of optical lithography (somewhere in the sub-0.18 µm area) and the lack of a clear alternative, progress is continuing in critical areas of deep submicron patterning. We review here two critical technologies, electron and X-ray based lithographies. These two technologies are interdependent and offer the key to the development of techniques which are capable of supporting future manufacturing. Finely focused beams of electrons have the resolution required to “write ” very high resolution patterns, but are inherently limited in throughput. X-ray Lithography is a parallel “printing ” system capable of extremely high throughput. We show how the imaging process in proximity X-ray lithography is capable of reaching the sub-100 nm range. However, the use of proximity X-ray lithography is dependent on the mask to form the correct image of the pattern and thus on the availability of an e-beam based mask patterning tool. The joint development of electron beam lithography patterning tools with high placement accuracy, of a better understanding of the mask mechanical response and of new aligners, clearly indicates that the goal of using X-ray lithography for nanolithography applications is reachable. 1 Parallel or Sequential? |
| File Format | |
| Language | English |
| Publisher Date | 1996-01-01 |
| Access Restriction | Open |
| Subject Keyword | Future Manufacturing High Throughput Imaging Process X-ray Lithography Clear Alternative Critical Technology Focused Beam Nanolithography Application Mask Mechanical Response Joint Development Sub-100 Nm Range Proximity X-ray Lithography Critical Area New Aligners Electron Beam Lithography Patterning Tool Semiconductor Industry Correct Image High Placement Accuracy Sub-100 Nm Pattern Parallel Printing System Deep Submicron Patterning High Resolution Pattern Optical Lithography |
| Content Type | Text |
| Resource Type | Article |
