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High temperature crystallized poly-si on molybdenum substrates for thin film transistor application.
| Content Provider | CiteSeerX |
|---|---|
| Author | Park, Joong Hyun Kim, Do Young Ko, Jae Kyung Yi, Junsin |
| Abstract | Abstract. Polycrystalline silicon thin film transistors (poly-Si TFTs) are used in a wide variety of applications, and will figure prominently in the future high-resolution, high-performance flat panel display technology. However, it is difficult to fabricate high performance poly-Si TFTs at temperatures lower than 300°C and the temperature of the process is limited to less than 600°C on glass. This paper describes a high temperature process above 750°C to obtain poly-Si films. Hydrogenated amorphous silicon (a-Si:H) layer was deposited on a flexible Mo metal substrate and crystallized by rapid thermal annealing. The a-Si:H films were crystallized at various temperatures between 750°C to 1050°C. The high temperature annealed poly-Si films illustrated field effect mobilities higher than 67 cm 2 /Vs. The poly-Si TFT showed an improved Ion/Ioff ratio of 10 6, reduced gate threshold voltage, and a field effect mobility increased by three orders. In this paper, we introduce the new TFTs process on a flexible substrate a very promising roll-to-roll process, and exhibit the properties of high temperature crystallized poly-Si TFT on Mo substrate. |
| File Format | |
| Access Restriction | Open |
| Subject Keyword | High Temperature Poly-si Tft Poly-si Film Field Effect Field Effect Mobility Future High-resolution Poly-si Tfts New Tfts Process Rapid Thermal Annealing High Performance Poly-si Tfts High-performance Flat Panel Display Technology Flexible Mo Metal Substrate Amorphous Silicon Promising Roll-to-roll Process Improved Ion Ioff Ratio Flexible Substrate Gate Threshold Voltage Polycrystalline Silicon Thin Film Transistor Various Temperature Wide Variety High Temperature Process Mo Substrate |
| Content Type | Text |
| Resource Type | Article |