NDLI: CVD Nano-Crystalline Tin Oxide Coatings on Glass Substrate: The Effect of Substrate Temperature

Content Provider	The American Society of Mechanical Engineers (ASME) Digital Collection
Author	Karsliog˘lu, Ramazan Akbulut, Hatem Alp, Ahmet
Copyright Year	2008
Abstract	Tin oxide thin films were grown by chemical vapor deposition (CVD) on glass substrates at atmospheric pressure (AP) and different temperatures of 400, 500 and 600 °C. The deposition times were also altered from 15 to 60 minutes with 15 minutes time intervals to investigate the effect of deposition time. A horizontal home-made reactor was used for the deposition from SnCl2 precursors with flowing pure oxygen at a rate 5 ccpm. The structure was analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) facilities to reveal the deposition mechanisms and crystalline structures. Energy-dispersive spectroscopy (EDS) was conducted to understand the elemental surface composition of the thin films produced. It was detected that the morphology and the oxide structure were changed with deposition time and temperature. The optical and electrical properties were also studied to reveal a relationship between physical properties and production parameters of the resultant thin films.
Sponsorship	Nanotechnology Institute
Starting Page	157
Ending Page	165
Page Count	9
File Format	PDF
ISBN	0791842916
DOI	10.1115/MN2008-47075
e-ISBN	1791838145
Volume Number	ASME 2008 2nd Multifunctional Nanocomposites and Nanomaterials
Conference Proceedings	ASME 2008 2nd Multifunctional Nanocomposites and Nanomaterials International Conference
Language	English
Publisher Date	2008-01-11
Publisher Place	Sharm El Sheikh, Egypt
Access Restriction	Subscribed
Subject Keyword	Thin films Atomic force microscopy Scanning electron microscopy Spectroscopy Temperature Oxygen Atmospheric pressure Electrical properties Glass Oxide coatings X-ray diffraction Chemical vapor deposition
Content Type	Text
Resource Type	Article

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