NDLI: Dynamic Simulation and Technologic Parameter Optimization of Ultra-Precision, Double-Sided Planar Polishing Machine

Content Provider	The American Society of Mechanical Engineers (ASME) Digital Collection
Author	Zhao, Yanwei Kim, Gap-Yong Du, Jianfeng Wen, Siwei
Copyright Year	2008
Abstract	The mechanical movement in ultra-precision polishing process is an important factor which influences the polishing quality. Based on chemical-mechanical polishing (CMP) principle of PE-1 type ultra-precision polishing machine, dynamic simulation and technologic parameter optimization was studied. Firstly, a virtual prototype was built. And this prototype was validated by comparing the testing values with theoretical results. Secondly, the dynamic and kinematics characteristics of the polishing process was simulated and analyzed. Through the study of the relationship between the input velocity ratio of planetary system and workpiece movement, researcher found that the movement of workpiece is only influenced by input velocity ratio of planetary system, not involve the load of cylinder and velocity of plate. Through the simulation of point moving on workpiece surface, researcher found that the average velocity of points along the radius is increase while the radius increases, and the average velocity of points on the same circle is equal. Through the simulation of movement route, researcher found that the points along the radius have similar route style considering the same input speed ratio of planetary system. Thirdly, technologic parameter optimization was studied. The optimization research of non-uniformity revealed that the speed of plate has effect on both removal rate and the amount of material. High velocity of plate can make for getting high removing quantity. And the optimization research of material removal rate revealed that the higher pressure can get higher removal rate. At last, on the condition of same pressure and speed of plate, the optimum result is gained. The results indicated that high velocity of plate can make for getting high removing quantity, and high pressure can make for getting high removal rate.
Starting Page	397
Ending Page	409
Page Count	13
File Format	PDF
ISBN	9780791848654
DOI	10.1115/IMECE2008-68514
e-ISBN	9780791838402
Volume Number	Volume 4: Design and Manufacturing
Conference Proceedings	ASME 2008 International Mechanical Engineering Congress and Exposition
Language	English
Publisher Date	2008-10-31
Publisher Place	Boston, Massachusetts, USA
Access Restriction	Subscribed
Subject Keyword	High pressure (physics) Simulation Kinematics Polishing Materials research Polishing equipment Engineering prototypes Pressure Optimization Stress Cylinders Testing
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in