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| Content Provider | The American Society of Mechanical Engineers (ASME) Digital Collection |
|---|---|
| Author | Xu, Zhigang Hilton, Corydon Watkins, Bobby Yarmolenko, Sergey Sankar, Jag |
| Copyright Year | 2003 |
| Abstract | Yttria stabilized zirconia (YSZ) thin films have been processed on polished silicon and porous strontium-doped lanthanum manganite (LSM) substrates by liquid fuel combustion chemical vapor deposition from combustion of an aerosol jet. The aerosol jet consists of Y- and Zr- containing metalorganics dissolved in toluene and high-purity oxygen. The morphology and thickness of the deposited films have been analyzed with scanning electron microscope. On the polished silicon substrates, thin and uniform films have been obtained. The grain growth rate is of the first order of the deposition time. The film growth rate was greatly enhanced by utilizing higher precursor concentrations, proper substrate temperature and the effect of thermophoresis. However, when the porous substrate is being coated, a more complex deposition process takes place. The initial deposition seems to be favored on the surface protrusions. Therefore, the covered areas serve as nucleation sites and the grains start to grow, giving rise to larger particles and rougher surface than the films on polished silicon. To enhance the pore-sealing rate, some pre-treatments and post-treatment have been used. Moreover, deposition parameters towards fast pore sealing have been investigated. Thin and continuous films with the film thickness less than 3 μm have been obtained. |
| Sponsorship | Materials Division |
| Starting Page | 343 |
| Ending Page | 348 |
| Page Count | 6 |
| File Format | |
| ISBN | 079183719X |
| DOI | 10.1115/IMECE2003-43330 |
| Volume Number | Materials |
| Conference Proceedings | ASME 2003 International Mechanical Engineering Congress and Exposition |
| Language | English |
| Publisher Date | 2003-11-15 |
| Publisher Place | Washington, DC, USA |
| Access Restriction | Subscribed |
| Subject Keyword | Oxygen Temperature Sealing (process) Polishing Combustion Scanning electron microscopes Film thickness Fuels Chemical vapor deposition Nucleation (physics) Strontium Thin films Zirconium Particulate matter Aerosols Electrolytes Silicon Lanthanum |
| Content Type | Text |
| Resource Type | Article |
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