NDLI: Stitching Technology Using Hybrid Actuators in Nano Imprint

Content Provider	The American Society of Mechanical Engineers (ASME) Digital Collection
Author	Chen, Cheng-Hung Yen, Jia-Yush Chen, Lien-Sheng Chang, Shuo-Hung
Copyright Year	2008
Abstract	With advancements in nanotechnology and the continuing reduction of the minimum feature size in integrated-circuit technologies, there is a need for next-generation lithography (NGL) tools. The direct transfer of grating structures stitched from interference lithography to a mold for nano imprinting offers a low-cost alternative for printing sub-100nm features with great potential accuracy, high resolution, and reductivity. This research presents dual stage laser-interferometer equipment to meet these requirements. In moving forward to the stitching of a small interference area, the most important issue is alignment. If the period of this interference fringe can be guaranteed, the stage can be moved in chronological alignment with the period. This paper also presents SEM results of stitching of a 600nm periodic structure.
Sponsorship	Design Engineering Division and Computers in Engineering Division
Starting Page	683
Ending Page	687
Page Count	5
File Format	PDF
ISBN	9780791843284
DOI	10.1115/DETC2008-49260
e-ISBN	0791838315
Volume Number	Volume 4: 20th International Conference on Design Theory and Methodology; Second International Conference on Micro- and Nanosystems
Conference Proceedings	ASME 2008 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference
Language	English
Publisher Date	2008-08-03
Publisher Place	Brooklyn, New York, USA
Access Restriction	Subscribed
Subject Keyword	Integrated circuits Printing Actuators Lasers Lithography Diffraction gratings Resolution (optics) Nanotechnology Interferometers Periodic structures
Content Type	Text
Resource Type	Article

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