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Extreme Ultraviolet Light Generating Apparatus
| Content Provider | The Lens |
|---|---|
| Abstract | An extreme ultraviolet light generating apparatus moves a generation position of extreme ultraviolet light based on an instruction from an external device and includes a chamber in which a target fed therein is irradiated with laser light so that the extreme ultraviolet light is generated from the target; a target feeder configured to output and feed the target into the chamber; a condensing mirror configured to condense the laser light on the target fed into the chamber; a stage configured to regulate a position of the target feeder; a manipulator configured to regulate a position of the condensing mirror; and a control unit configured to be able to control at least one of the stage, the manipulator, and a radiation timing of the laser light to the target, in a feedforward method, when the generation position is moved during generation of the extreme ultraviolet light. |
| Related Links | https://www.lens.org/images/patent/051-674-532-592-133/pdf/US_2018_A1_20180352641_051-674-532-592-133.pdf |
| Language | English |
| Publisher Date | 2019-03-05 |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Patent |
| Jurisdiction | United States of America |
| Date Applied | 2018-08-06 |
| Agent | Studebaker & Brackett Pc |
| Applicant | Gigaphoton Inc |
| Application No. | 201816055274 |
| Claim | An extreme ultraviolet light generating apparatus in which a generation position of extreme ultraviolet light is moved based on an instruction from an external device, the apparatus comprising: a chamber in which a target fed into the chamber is irradiated with laser light so that the extreme ultraviolet light is generated from the target; a target feeder configured to output the target and feed the target into the chamber; a condensing mirror configured to condense the laser light on the target fed into the chamber; a stage configured to regulate a position of the target feeder; a manipulator configured to regulate a position of the condensing mirror; and a control unit configured to be able to control at least one of the stage, the manipulator, and a radiation timing of the laser light to the target, in a feedforward method, when the generation position is moved during generation of the extreme ultraviolet light. The extreme ultraviolet light generating apparatus according to claim 1 , further comprising a plurality of EUV light sensors configured to measure energy of the extreme ultraviolet light from different directions, wherein the control unit is configured to be able to perform EUV light centroid control, the EUV light centroid control being performed on the manipulator in a feedback method such that a centroid position of the extreme ultraviolet light calculated based on measurement results of the EUV light sensors comes to a given position, during generation of the extreme ultraviolet light. The extreme ultraviolet light generating apparatus according to claim 2 , wherein when the generation position is moved during generation of the extreme ultraviolet light, the control unit stops execution of the EUV light centroid control, and resumes execution of the EUV light centroid control after controlling at least one of the stage, the manipulator, and the radiation timing. The extreme ultraviolet light generating apparatus according to claim 2 , wherein in a case of controlling the manipulator when the generation position is moved during generation of the extreme ultraviolet light, the control unit controls the manipulator by performing the EUV light centroid contro The extreme ultraviolet light generating apparatus according to claim 2 , further comprising a target detection sensor configured to detect the target in a predetermined region in the chamber through which the target passes, after the target is output from the target feeder and before the target is irradiated with the laser light, wherein the control unit specifies a passage timing that is a timing when the target passes through the predetermined region, based on a detection result of the target detection sensor, the control unit causes a laser device to output the laser light at a timing when a delay time is added to the passage timing such that the target that passed through the predetermined region is irradiated with the laser light, and the control unit controls the radiation timing by changing the delay time. The extreme ultraviolet light generating apparatus according to claim 5 , wherein when the generation position is moved during generation of the extreme ultraviolet light, the control unit determines at least one of a driving amount of the stage, a driving amount of the manipulator, and a change amount of the delay time, based on a moving distance of the generation position according to the instruction, and the control unit controls at least one of the stage, the manipulator, and the radiation timing, according to at least one of the driving amount of the stage, the driving amount of the manipulator, and the change amount of the delay time determined. The extreme ultraviolet light generating apparatus according to claim 6 , wherein the extreme ultraviolet light is generated when plasma emits light including the extreme ultraviolet light, the plasma being generated from the target being irradiated with the laser light, the instruction includes a differential value between a plasma current position that is a current position of the plasma and a plasma target position that is the position of the plasma after being moved according to the instruction, the control unit estimates the position of the plasma as the generation position, and the control unit specifies the moving distance from the differential value. The extreme ultraviolet light generating apparatus according to claim 7 , wherein when the specified moving distance is equal to or smaller than an allowable value, the control unit determines at least one of the driving amount of the stage, the driving amount of the manipulator, and the change amount of the delay time, with use of the differential value, and when the specified moving distance is larger than the allowable value, the control unit determines at least one of the driving amount of the stage, the driving amount of the manipulator, and the change amount of the delay time, with use of the allowable value. The extreme ultraviolet light generating apparatus according to claim 8 , wherein when the specified moving distance is equal to or smaller than the allowable value, the control unit controls once at least one of the stage, the manipulator, and the radiation timing, and when the specified moving distance is larger than the allowable value, the control unit controls a plurality of times at least one of the stage, the manipulator, and the radiation timing. The extreme ultraviolet light generating apparatus according to claim 9 , further comprising an image sensor configured to capture an image of a region including a position of the target fed into the chamber, wherein the control unit specifies the plasma current position with use of the image captured by the image sensor, and the control unit sets a control objective position of the position of the target fed into the chamber, based on the specified plasma current position and the differential value. The extreme ultraviolet light generating apparatus according to claim 10 , wherein the control unit determines the driving amount of the stage by determining a change amount of the control objective position based on the specified moving distance. The extreme ultraviolet light generating apparatus according to claim 11 , wherein the image sensor includes: a first image sensor configured to capture an image of the target fed into the chamber, and a second image sensor configured to capture an image of a trajectory of the target fed into the chamber, the control unit measures the position of the target fed into the chamber with use of the images captured by the first image sensor and the second image sensor, and the control unit specifies the plasma current position by estimating the measured position of the target as the plasma current position. The extreme ultraviolet light generating apparatus according to claim 11 , wherein the image sensor includes a plurality of first image sensors configured to capture images of the plasma from different directions, the plasma being generated from the target fed into the chamber, the control unit measures the position of the plasma with use of the images captured by the first image sensors, and the control unit specifies the plasma current position from the measured position of the plasma. The extreme ultraviolet light generating apparatus according to claim 1 , further comprising: a mirror provided on an optical path of pre-pulse laser light, the pre-pulse laser light being radiated to the target fed into the chamber and dispersing the target, the mirror being configured to reflect the pre-pulse laser light, and a mirror driving unit configured to drive the mirror, wherein the control unit performs high-speed centroid control to control a centroid position of the extreme ultraviolet light by driving the mirror by the mirror driving unit, and performs centroid auxiliary control to maintain the high-speed centroid control by driving the condensing mirror by the manipulator, and changes execution frequency of the high-speed centroid control and the centroid auxiliary control depending on response speed of the mirror driving unit and the manipulator. |
| CPC Classification | Measurement Of Intensity; Velocity; Spectral Content; Polarisation; Phase Or Pulse Characteristics Of Infrared; Visible Or Ultraviolet Light;Colorimetry;Radiation Pyrometry PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES; e.g. FOR PRINTING; FOR PROCESSING OF SEMICONDUCTOR DEVICES;MATERIALS THEREFOR;ORIGINALS THEREFOR;APPARATUS SPECIALLY ADAPTED THEREFOR; X-RAY TECHNIQUE |
| Examiner | Mark R Gaworecki |
| Extended Family | 051-674-532-592-133 103-658-151-547-739 089-617-801-269-798 066-465-960-936-506 090-732-904-153-404 093-118-624-804-099 |
| Patent ID | 10225918 |
| Inventor/Author | Nishimura Yuichi Yabu Takayuki |
| IPC | G01J1/42 G03F7/20 H05G2/00 |
| Status | Active |
| Owner | Gigaphoton Inc |
| Simple Family | 051-674-532-592-133 103-658-151-547-739 066-465-960-936-506 089-617-801-269-798 090-732-904-153-404 093-118-624-804-099 |
| CPC (with Group) | G01J2001/4247 G01J1/4228 G03F7/70033 G01J1/4209 G01J1/4257 G01J1/429 H05G2/0086 H05G2/0084 |
| Issuing Authority | United States Patent and Trademark Office (USPTO) |
| Kind | Patent/New European patent specification (amended specification after opposition procedure) |
